Advantest Corporation (TSE: 6857)(NYSE: ATE) today announced that it has developed a new mask defect review tool, the Mask DR-SEM E5610, for reviewing and classifying ultra-small defects in photomask blanks.
Elemental Composition Analysis OptionThe E5610 features an optional EDS (energy dispersive X-ray spectrometry) module that performs elemental analysis—an advanced method of mapping mask blank defects. About Advantest Corporation A world-class technology company, Advantest is the leading producer of automatic test equipment (ATE) for the semiconductor industry and a premier manufacturer of measuring instruments used in the design and production of electronic instruments and systems. Its leading-edge systems and products are integrated into the most advanced semiconductor production lines in the world. The company also focuses on R&D for emerging markets that benefit from advancements in nanotech and terahertz technologies, and has recently introduced multi-vision metrology scanning electron microscopes essential to photomask manufacturing, as well as a groundbreaking 3D imaging and analysis tool. Founded in Tokyo in 1954, Advantest established its first subsidiary in 1982, in the USA, and now has subsidiaries worldwide. More information is available at www.advantest.com. All information supplied in this release is correct at the time of publication, but may be subject to change.