About NanometricsNanometrics is a leading provider of advanced, high-performance process control metrology and inspection systems used primarily in the fabrication of semiconductors, high-brightness LEDs, data storage devices and solar photovoltaics. Nanometrics’ automated and integrated systems address numerous process control applications, including critical dimension and film thickness measurement, device topography, defect inspection, overlay registration, and analysis of various other film properties such as optical, electrical and material characteristics. The company’s process control solutions are deployed throughout the fabrication process, from front-end-of-line substrate manufacturing, to high-volume production of semiconductors and other devices, to advanced wafer-scale packaging applications. Nanometrics’ systems enable device manufacturers to improve yields, increase productivity and lower their manufacturing costs. The company maintains its headquarters in Milpitas, California, with sales and service offices worldwide. Nanometrics is traded on NASDAQ Global Select Market under the symbol NANO. Nanometrics’ website is http://www.nanometrics.com.
Nanometrics Incorporated (NASDAQ: NANO), a leading provider of advanced process control metrology and inspection systems, today announced its IMPULSE ® integrated metrology (IM) system, along with its industry-leading NanoDiffract ® software for optical critical dimension (OCD) metrology, have been selected by a leading foundry for deployment into advanced 2x nm volume production for front-end-of-line etch process control. “Nanometrics has worked closely with this leading foundry and a prominent etch OEM platform provider to demonstrate superior process control for key layers and structures with our integrated IMPULSE OCD system and NanoDiffract software. We are pleased to have our comprehensive solution for Process Control Metrology selected for proliferation into volume production for our customer’s second generation 2x nm products,” commented Steve Bradley, Director of Integrated Metrology at Nanometrics. “Next-generation device manufacturing requires reduced critical dimension (CD) variances within-wafer, wafer-to-wafer, and lot-to-lot, and the IMPULSE system provides unprecedented control of the CDs most closely associated with end device performance and yield.” This selection includes a multi-system follow-on order that represents the first phase of purchases for the deployment of Nanometrics IM solutions into this customer’s most advanced 2x nm volume production line. The IMPULSE system for OCD has been qualified and integrated on multiple platforms from the leading etch companies for transistor, contact and interconnect applications. Beyond etch integrations, Nanometrics’ IM solutions are available in configurations to support control of other key fab processes, including CMP, lithography and CVD, and for both thin film and OCD applications. When integrated onto the Lynx platform, in combination with other Nanometrics metrology and inspection systems, device manufacturers can address the most challenging process control applications with the lowest cost of ownership. Nanometrics’ customers have the option of deploying integrated metrology in conjunction with automated standalone systems, the Lynx™ Cluster Metrology Platform and the NanoCD™ Suite for a complete fab-wide metrology process control solution.