Intevac, Inc. (Nasdaq:IVAC) announced today that the company will participate in the 6 th International Photovoltaic Power Generation Conference and Exhibition in Shanghai, China. Intevac will showcase their revolutionary, high value, low-cost solutions for the solar industry. Intevac will feature its LEAN SOLAR ™ processing platform that offers the benefits of high productivity and precise film property control in a small footprint. This common platform runs a suite of crystalline-silicon applications including ion implant, plasma etch and PVD, and can be configured for specific requirements. Intevac will also be presenting a paper titled “ Plasma Texturing for Efficiency Improvements in c-Si Solar Cells” on Friday, May 18 th. Intevac Booth #265 will be located in Hall E5 of the Shanghai New International Exposition Center (SNEC). Booth hours are Wednesday and Thursday, May 16 th and 17 th from 9 a.m. to 5:00 p.m., and Friday, May 18 th from 9 a.m. to 3 p.m. About SNEC 2012 PV Power Expo This year’s SNEC International Photovoltaic Power Generation Exhibition is expected to have approximately 2,200 exhibitors and over 200,000 visitors from 90 different countries, including government officials and professionals from related industries. The show is held from May 16 th to 18 th at Shanghai New International Expo Center. About Intevac Intevac was founded in 1991 and has two businesses: Equipment and Intevac Photonics. In our Equipment business, we are a leader in the design, development and manufacturing of high-productivity, vacuum process equipment solutions. Our systems are production-proven for high-volume manufacturing of small substrates with precise thin film properties, such as those required in the hard drive and solar cell markets we currently serve. In the hard drive industry, our 200 Lean® systems process approximately 60% of all magnetic disk media produced worldwide. In the solar cell manufacturing industry, our recently-introduced LEAN SOLAR™ platform, with applications including deposition, texture etch and ion implant, increases the conversion efficiency of silicon solar cells.