Semiconductor design software firm
said Wednesday that it is collaborating with
on the development and delivery of advanced lithography software models and design for manufacturing (DFM)-enabled lithography manufacturing solutions for 45 nanometers (nm) and below.
The Synopsys-Nikon collaboration brings together electronic design automation (EDA) design and optical lithography imaging system expertise to focus on building next-generation "manufacturing-aware" OPC and RET lithography simulation models, the Mountain View, Calif.-based company said.
The company also said that its HSPICE simulator circuit simulator has been adopted by
as its sign-off simulator for library characterization.
The company's shares were trading up 34 cents, or 1.8%, at $19.72 Wednesday.
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