July 24, 2012
, Inc. (Nasdaq: ACLS), a leading supplier of innovative, high-productivity solutions for the semiconductor industry, announced today that its
Optima HDx high current implanter
has achieved a new industry milestone in source life performance, by delivering over 500 hours of source life for carbon and germanium species independently. The system combines revolutionary ion source technology, the
, with SPECTRA
Solifex, an innovative, new gas delivery system designed for Axcelis by
The Linde Group's Gases Division
. Together, these technologies significantly extend source life for carbon and germanium applications, providing chipmakers increased system availability, higher overall productivity, and lower cost of consumables; all translating to a compelling cost of ownership advantage.
"We're pleased to be able to offer customers this cost of ownership advantage, which reduces the annual operating cost of the fab," said
, Executive Vice President of Product Development, Engineering and Marketing. "Our Eterna ELS3 source, supported by the Linde SPECTRA
Solifex gas delivery system, is already in the field with leading logic and memory customers and they are experiencing remarkable performance results. We partnered with Linde because of their expertise to develop, deliver and support this new technology in the field. We look forward to working with them on additional performance enhancements in the future."
With the Eterna ELS3, Axcelis has leveraged its ion source technology expertise to deliver the industry's next generation in source performance for the sub 2Xnm node. The Eterna ELS3 includes patent pending hardware and process improvements designed to extend source life by an unprecedented 500% improvement for Carbon, and a 500% improvement for Germanium applications. The system is available as an option on new Optima HDx tools, as well as an upgrade to installed systems.