To make these devices smaller they also have to add layers in order to make the structures that they want, every new layer is the new measurement opportunity. In addition as they make the devices smaller the tolerance for variation is reduced and so it right they need to make additional measurement they have excel.So as a result process control measurements have a key metric relationships to -- for the advancement of these devices, as they scale down, which is represented by the orange line, as they scale down on the device structure, they need more measurements and more steps and therefore more tools, so that’s best kind of a underlying driver with high process control. Within our technology space, our flagship product is known as optical critical dimension, it’s an optical technique for making these measurements in a non-destructive way.
Nanometrics' CEO Discusses At Citi 8th Annual US Small/Mid Cap - Conference Call Transcript
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